Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 385-388
- https://doi.org/10.1016/s0167-9317(96)00206-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Reduced optical scattering loss in vertical-cavity lasers using a thin (300 /spl Aring/) oxide apertureIEEE Photonics Technology Letters, 1996
- Monolithic integration of vertical-cavity laserdiodes with refractive GaAsmicrolensesElectronics Letters, 1995
- Vertical-cavity surface-emitting lasers with integratedrefractive microlensesElectronics Letters, 1995
- Technique for monolithic fabrication of microlens arraysApplied Optics, 1988