Hall voltage measurements in RE-TM/X multilayered films
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 26 (5) , 2750-2752
- https://doi.org/10.1109/20.104860
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- The sputter deposition of precision metal multilayersVacuum, 1988
- The effect of sputter-deposition conditions on the coercive force in amorphous rare-earth-transition-metal thin filmsIEEE Transactions on Magnetics, 1988
- Amorphous rare-earth–transition-metal thin films with an artificially layered structureJournal of Applied Physics, 1987
- Unexpected unidirectional anisotropy in amorphous Tb-Fe/Ni-Fe-Mo bilayer filmsApplied Physics Letters, 1987