Dissociation of the Hydroxyl Radical in an rf Discharge

Publisher Website
Google Scholar
Abstract
The following information was obtained on by‐product concentrations from the rf discharge of water vapor—molecular oxygen mixtures at H2O pressures from 50 to 200 μ and O2 pressures from 0 to 300 μ: the absence of the OH species below the region of 100 μ water vapor pressure, together with the absence of the O species above the region of 130‐μ water vapor pressure, the independence of the OH and O cutoff points on the amount of oxygen added to the water vapor previous to the discharge, OH enhancements of as high as a factor of 5 to 1 upon addition of sufficient oxygen to the mixture, and total OH concentration throughout the recorded pressure range of less than 1%.
Keywords

This publication has 2 references indexed in Scilit: