Thin Film Optical Circuit Fabrication Using a CO2 Laser
- 1 January 1980
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 19 (S1)
- https://doi.org/10.7567/jjaps.19s1.451
Abstract
Film sputtered from SiO2 25 mol%–Ta2O5 75 mol% target presents a refractive index decrease up to 4.1×10-2 by CO2 laser irradiation. Some optical circuits such as mirror, branching circuit, channel waveguide have been fabricated using the index decrease phenomenon. In the experiment, the maximum reflecting angle is 11.5°. A typical bent channel waveguide with 7.5 mm bent radius has a low propagation loss, 1.1 dB/cm at 0.633 µm wavelength. It is shown that the well-known ray equation is applicable to design the optical circuits.Keywords
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