Determination of the stress level in growing NiO films by X-ray diffraction
- 28 February 1983
- journal article
- Published by Elsevier in Scripta Metallurgica
- Vol. 17 (2) , 179-182
- https://doi.org/10.1016/0036-9748(83)90095-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Caractérisation mécanique des surfaces par diffraction XMatériaux & Techniques, 1981
- High temperature deformation of polycrystalline NiO and CoOActa Metallurgica, 1977
- The Structure of Thin Oxide Films Formed on Nickel CrystalsJournal of the Electrochemical Society, 1969
- A diffraction measurement of the structure of Cu2O films grown on copperActa Crystallographica, 1960
- Electrical Properties of NiOPhysical Review B, 1954