Comment on “Evaluation of concentration-depth profiles by sputtering in SIMS and AES” by S. Hofmann
- 1 April 1979
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 18 (4) , 425-426
- https://doi.org/10.1007/bf00899698
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- On the influence of reactive gases on sputtering and secondary ion emissionApplied Physics A, 1978
- Depth resolution in sputter profilingApplied Physics A, 1977
- Evaluation of concentration-depth profiles by sputtering in SIMS and AESApplied Physics A, 1976
- Scanning Electron Microscopic Observation of Metal Surfaces Eroded by Argon IonsJapanese Journal of Applied Physics, 1974
- Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemissionThe European Physical Journal A, 1970
- Atomic and Ionic Impact Phenomena on Metal SurfacesPublished by Springer Nature ,1965