Finite metal-sheet-resistance in contact resistivity measurements: Application to Si/TiN contacts
- 30 November 1983
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 26 (11) , 1065-1067
- https://doi.org/10.1016/0038-1101(83)90003-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Thermal stability of titanium nitride for shallow junction solar cell contactsJournal of Applied Physics, 1981
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- Aluminum-silicon ohmic contact on “shallow” junctionsSolid-State Electronics, 1980
- Models for contacts to planar devicesSolid-State Electronics, 1972