Thermal Expansion Coefficient of a Pyrolitically Deposited Silicon Nitride Film
- 1 October 1967
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 6 (10)
- https://doi.org/10.1143/jjap.6.1252
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Preparation and Properties of Pyrolytic Silicon NitrideJournal of the Electrochemical Society, 1966