Development of SSQ Based 157 nm Photoresist.

• 1 January 2002
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 15  (4) , 693-698
• https://doi.org/10.2494/photopolymer.15.693

Abstract

Keywords

• NM PHOTORESIST
• DEVELOPMENT OF SSQ BASED