Photolocking-A new technique for fabricating optical waveguide circuits

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Abstract
Low‐loss dielectric optical waveguides have been made by a new process in which a photochemical reaction is used to lock or fix a dopant in a polymer film with a lower refractive index, and unreacted dopant is then removed by heating. Narrow guides ([inverted lazy s]4 μm wide, Δn [inverted lazy s] 1%) were formed by laser beam writing at λ=364 nm or by contact printing at λ=313 nm, and had losses of 0.20±0.05 dB/cm at λ=633 nm.