Electrostatic probe measurements for microwave plasma-assisted chemical vapor deposition of diamond

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Abstract
The electron energy and density in a diamond microwave plasma-assisted chemical vapor deposition reactor are determined using a double-electrostatic-probe technique. For a reactor feed gas composition of 2% CH4, 1% O2 in H2, electron temperatures of 6 eV and electron densities of ∼1.0×1011 cm−3 were measured. These values are consistent with optical emission spectroscopic results. The electron temperature is not strongly dependent on the amount of O2 added to the reactor feed mixture, indicating that the plasma essentially retains the energetic parameters of a hydrogen plasma.