The role of the substrate in photoenhanced metalorganic chemical vapor deposition

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Abstract
A GaAslaser diode has been used as the light source for the selective epitaxialgrowth of GaAs by photoenhanced metalorganic chemical vapor deposition (PE‐MOCVD). The use of GaAs/InGaP layered structures as substrates for these experiments permitted to accurately control the availability of photoexcited carriers reaching the GaAsgrowthsurface. The experimental results obtained rule out pure pyrolysis and photolysis as possible mechanisms responsible for the PE growth rate, and indicate that photoexcited carriers are directly involved in the PE process. The experimental data are consistent with a kinetic model that invokes surface recombination as the main physical mechanism for the PE growth rate effect.

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