Introduction of functional groups into polymer films via deep-UV photolysis or electron-beam lithography: modification of polystyrene and poly(3-octylthiophene) by a functionalized perfluorophenyl azide
- 1 July 1992
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 4 (4) , 879-884
- https://doi.org/10.1021/cm00022a025
Abstract
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