Low-temperature atmospheric-pressure chemical vapor deposition of tungsten oxide thin films
- 25 November 1993
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 235 (1-2) , 15-16
- https://doi.org/10.1016/0040-6090(93)90233-f
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Spray pyrolysis elecrochromic WO3 films: Electrical and X-ray diffraction measurementsThin Solid Films, 1990
- Structure and optical properties of WO3 thin films prepared by chemical vapour depositionThin Solid Films, 1987
- Electrochromic coatings for smart windows: Crystalline and amorphous WO3 filmsThin Solid Films, 1985