Maskless ion beam lithography system
- 31 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 469-472
- https://doi.org/10.1016/s0167-9317(99)00042-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Production of low energy spread ion beams with multicusp sourcesNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1996
- Fabrication of 0.1 μm metal oxide semiconductor field-effect transistors with the atomic force microscopeApplied Physics Letters, 1995