Free radicals formed by reaction of silane with hydrogen atoms in rare gas matrices at very low temperatures
- 1 November 1985
- journal article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 83 (9) , 4504-4510
- https://doi.org/10.1063/1.449018
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- E.S.R. study of the radicals formed by radiolysis of PH3and photochemical reaction of H and PH3in low temperature matricesMolecular Physics, 1984
- Nucleophilic Displacement at Silicon: Recent Developments and Mechanistic ImplicationsPublished by Elsevier ,1982
- On the anisotropic electron spin resonance spectroscopic parameters and motional states of matrix-isolated silyl (SiH3) radical at low temperaturesSpectrochimica Acta Part A: Molecular Spectroscopy, 1980
- Anomalies in the Structural Chemistry of SiliconAngewandte Chemie International Edition in English, 1973
- Reaction of H and CH3, radicals with silanes. Evidence for SiH5 radicalChemical Physics Letters, 1972
- Electron spin resonance of organosilyl radicals in solutionJournal of the American Chemical Society, 1969
- Electron Spin Resonance of Free Radicals Formed from Group-IV and Group-V Hydrides in Inert Matrices at Low TemperaturePhysical Review B, 1968
- ESR of Free Radicals Trapped in Inert Matrices at Low Temperature: CH3, SiH3, GeH3, and SnH3The Journal of Chemical Physics, 1966
- Free Rotation in Solids at 4.2°KThe Journal of Chemical Physics, 1958