Preparation of NASICON thin films by dip-coating on Si/SiO2 wafers and corresponding C-V measurements
- 15 February 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 196 (2) , 283-294
- https://doi.org/10.1016/0040-6090(91)90372-5
Abstract
No abstract availableKeywords
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