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Range Distribution of Implanted Arsenic in Silicon Dioxide
Home
Publications
Range Distribution of Implanted Arsenic in Silicon Dioxide
Range Distribution of Implanted Arsenic in Silicon Dioxide
KT
Katsuhiro Tsukamoto
Katsuhiro Tsukamoto
YA
Youichi Akasaka
Youichi Akasaka
KH
Kazuo Horie
Kazuo Horie
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1 April 1977
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 16
(4)
,
663-664
https://doi.org/10.1143/jjap.16.663
Abstract
No abstract available
Keywords
ARSENIC
Cited
Cited by 10 articles
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