Density and index of refraction of water ice films vapor deposited at low temperatures
- 22 February 1998
- journal article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 108 (8) , 3321-3326
- https://doi.org/10.1063/1.475730
Abstract
The density of 0.5–3 μm thick vapor-deposited films of waterice were measured by combined optical interferometry and microbalance techniques during deposition on an optically flat gold substrate from a capillary array gas source. The films were of high optical quality with an index of refraction of 1.29±0.01 at 435.8 nm, a density of 0.82±0.01 g/cm 3 , and a porosity of 0.13±0.01. In contrast to previous studies, none of the measured properties exhibited any significant variation with growth rate or temperature over the range studied (0.6–2 nm/min, 20–140 K).Keywords
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