Spectroscopic investigation of electronic and vibronic properties of ion-beam-deposited and thermally treated ultrathin C:H films
- 15 June 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 49 (24) , 17307-17318
- https://doi.org/10.1103/physrevb.49.17307
Abstract
C:H films in the thickness range ]/[] ratio of about unity. Vibrational spectroscopy reveals that at the film surfaces H atoms are bound to C atoms in sp, aromatic , and hybridization states. From the vibrational spectra, the presence of -C≡CH, (aromatic)=CH, and -, x=1,2,3 groups at the surface is inferred. Upon annealing, the films at higher temperatures, 500–1400 K, sp, , and groups get destroyed sequentially, paralleled by evolution of hydrogen (major product) and hydrocarbon species (minor product) from the films. After annealing at 1040 K, vibrational spectra exhibit only a CH-related C-H stretch band and, accordingly, from EELS increased bonding in the annealed films is obtained. This stability sequence of groups at the carbon network is in accordance with the expectations drawn from kinetic and thermodynamic data of hydrocarbons. The chemical structure of the deposited C:H films is insensitive to the nature of the deposition ion, e.g., methane, ethane, ethylene, or benzene, from which it is suggested that specific C-H bonding in the deposition ions does not act as a precursor for the film structure. Films deposited in the submonolayer range exhibit primarily C-H bonding in accordance with a simple picture of the initial growth of the films.
Keywords
This publication has 24 references indexed in Scilit:
- Spectroscopic identification of CH species in C:H films using HREELSSurface Science, 1993
- Mechanism of chemical erosion of sputter-deposited C:H filmsApplied Physics Letters, 1992
- STM investigation of single layer graphite structures produced on Pt(111) by hydrocarbon decompositionSurface Science, 1992
- Mole fractions of H, CH3, and other species during filament-assisted diamond growthApplied Physics Letters, 1991
- Methyl radical and H-atom concentrations during diamond growthJournal of Applied Physics, 1990
- Formation of hydrogenated amorphous carbon films of controlled hardness from a methane plasmaPhysical Review B, 1990
- Interactions of low energy reactive ions with surfaces. IV. Chemically bonded diamond-like films from ion-beam depositionThe Journal of Chemical Physics, 1988
- Thermal gas effusion from hydrogenated amorphous carbon filmsApplied Physics Letters, 1987
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983
- Stability and reactivity of (5×20) and (1×1) Pt(100) surfacesJournal of Vacuum Science and Technology, 1980