Reactive-ion etching of 0.2 μm period gratings in tungsten and molybdenum using CBrF3
- 1 January 1985
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 3 (1) , 272-275
- https://doi.org/10.1116/1.583244
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: