Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains

• 1 May 2001
• journal article
• research article
• Published by Wiley in Advanced Materials
• Vol. 13  (9) , 670-672
• https://doi.org/10.1002/1521-4095(200105)13:9<670::aid-adma670>3.0.co;2-3

Abstract

Keywords

• COPOLYMERIZATION
• FREE RADICAL
• PHOTOACID GENERATORS
• RESISTS
• CHEMICALLY AMPLIFIED
• LITHOGRAPHIC