MOCVD Deposition of MgAl2O4 Films Using Metal Alkoxide Precursors
- 1 October 1994
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 6 (10) , 1615-1619
- https://doi.org/10.1021/cm00046a009
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: