Germanide formation by thermal treatment of platinum films deposited on single-crystal Ge〈100〉 substrates
- 1 July 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 81 (3) , 207-211
- https://doi.org/10.1016/0040-6090(81)90483-1
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Growth kinetics of Pd2Ge and PdGe on single-crystal and evaporated germaniumThin Solid Films, 1977
- The first phase to nucleate in planar transition metal-germanium interfacesThin Solid Films, 1977
- Influence of the nature of the Si substrate on nickel silicide formed from thin Ni filmsThin Solid Films, 1976
- First phase nucleation in silicon–transition-metal planar interfacesApplied Physics Letters, 1976