Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition
- 1 September 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 93 (2-3) , 175-180
- https://doi.org/10.1016/s0257-8972(97)00040-6
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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