Factors influencing the morphologies of boron deposited by chemical vapour deposition
- 1 March 1980
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 70 (1) , 77-96
- https://doi.org/10.1016/0022-5088(80)90275-1
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Techniques for the preparation of boron fibresJournal of Materials Science, 1979
- Structure of Deposits‐Process Relationships in the Chemical Vapor Deposition of BoronJournal of the Electrochemical Society, 1977
- B48B2C2 und B48B2N2, zwei Nichtmetallboride mit der Struktur des sog. I tetragonalen BorsJournal of the Less Common Metals, 1972
- Stickstoffinduziertes Gitter beim Bor: I-tetragonales Bornitrid (B12)4B2N1–2 / The Nitrogen-Induced Lattice of Boron: I-Tetragonal Boron Nitride (B12)4B2N1_2Zeitschrift für Naturforschung B, 1971
- Kohlenstoff-induzierte gitter beim bor: I-tetragonales (B12)4B2C und (B12)4B2C2Journal of the Less Common Metals, 1971
- Zur bildung der tetragonalen modifikation des borsJournal of the Less Common Metals, 1968
- Crystalline modifications of boron deposited on boron substratesJournal of the Less Common Metals, 1966
- Crystallization of Massive Amorphous BoronJournal of the American Chemical Society, 1966
- Comments on the Paper “On the Interpretation of Electron Diffraction Patterns from ‘Amorphous’ Boron”Physica Status Solidi (b), 1966
- On the Interpretation of Electron Diffraction Patterns from “Amorphous” BoronPhysica Status Solidi (b), 1966