Abstract
The presence of a deep-level trap coupled to a quantum-dot heterostructure is shown to provide a rapid energy-relaxation pathway through which electrons may thermalize. A capture process is considered whereby a free conduction-band electron is captured into the ground conduction-band state of a quantum dot by multiphonon-assisted tunneling through the trap. As an example calculation, transition rates for a 5 nm radius In0.5 Ga0.5As/GaAs quantum dot coupled to the defect M1 are calculated as a function of separation between the quantum dot and the deep level. For separations less than ≊10 nm these rates are found to be in excess of 1010 s1 at 4.2 K. The result suggests that the presence of point defects may serve to enhance the luminescence efficiency of quantum-dot material. The physical situation described in this paper could only arise if the spatial distribution of defects were strongly correlated with that of the quantum-dot structures, e.g., through formation of interface states or point defects as a consequence of the growth process. With this caveat, the proposed mechanism may possibly explain the failure to observe a significant phonon bottleneck effect in recent work on In1x GaxAs quantum-dot structures [e.g., Appl. Phys. Lett. 64, 2815 (1994)].