On the robustness of LDD nMOS transistors subjected to measurement of drain breakdown voltage
- 31 August 1990
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 33 (8) , 1043-1048
- https://doi.org/10.1016/0038-1101(90)90218-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A simple technique to induce and control short pulses of deep drain-source breakdown conditionsIEEE Electron Device Letters, 1989
- Subbreakdown drain leakage current in MOSFETIEEE Electron Device Letters, 1987
- MOSFET drain breakdown voltageIEEE Electron Device Letters, 1986
- A numerical model of avalanche breakdown in MOSFET'sIEEE Transactions on Electron Devices, 1978