Formation of amorphous silicide nanoclusters in chromium- and titanium-implanted silica
- 6 November 1995
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 67 (19) , 2884-2886
- https://doi.org/10.1063/1.114817
Abstract
Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1×1017 cm−2 in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6±0.3 and [Ti]/[Si]=1.1±0.3, respectively, as obtained by energy dispersive spectroscopic x‐ray microanalysis and confirmed by x‐ray photoelectron spectroscopyanalysis. Titanium‐implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix.Keywords
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