Control of hydrocarbon radicals and film deposition by using a whistler wave discharge in range of radio frequency
- 18 November 1991
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (21) , 2675-2677
- https://doi.org/10.1063/1.105903
Abstract
Production of hydrocarbon radicals is controlled by using a whistler wave discharge in range of radio frequency in a low pressure region (∼0.1 Pa). Plasma density of 1010–1013 cm−3, electron temperature of 2–20 eV is obtained for the discharge of the admixture of Ar and small content of source gases (CH4, C2H2, CO). Spectroscopic measurement indicates that densities of CH and H radicals and the deposition rate of amorphous carbon:H film increase with electron density, electron temperature, and source gas pressure. The etching effect of H atoms influences on the deposition rate and a high deposition rate (90 μm/h for CO/Ar discharge) is obtained even in a low neutral pressure discharge.Keywords
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