Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching
- 1 June 1979
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (6) , 3841-3848
- https://doi.org/10.1063/1.326499
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Diffraction gratings for color filtering in the zero diffraction orderApplied Optics, 1978
- Rigorous diffraction theory for transmission phase gratings with deep rectangular groovesJournal of the Optical Society of America, 1978
- Reactive sputtering of PTFE films in argon-CF4 mixturesThin Solid Films, 1978
- Profile control by reactive sputter etchingJournal of Vacuum Science and Technology, 1978
- Fabrication of deep square wave structures with micron dimensions by reactive sputter etchingApplied Physics Letters, 1978
- Ion-surface interactions in plasma etchingJournal of Applied Physics, 1977
- Redeposition—A serious problem in rf sputter etching of structures with micronmeter dimensionsJournal of Vacuum Science and Technology, 1977
- Color pictures using the zero diffraction order of phase grating structuresOptics Communications, 1976
- Influence of the Angle of Incidence on Sputtering YieldsJournal of Applied Physics, 1959