X-ray replication of masks using the synchrotron radiation produced by the ACO storage ring
- 15 September 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 29 (6) , 370-372
- https://doi.org/10.1063/1.89090
Abstract
Synchrotron radiation emitted by the 540‐MeV storage ring of the University of Orsay was used to replicate masks with submicron features on PMM resist. Exposure times were of the order of a few minutes. The masks used were gold (1500–3500 Å thick) on 2.5‐μm Mylar. Calculations show that the wavelengths principally involved in making the exposure are at 540 MeV centered around 14 Å and at 400 MeV around 50 Å.Keywords
This publication has 2 references indexed in Scilit:
- Replication of 0.1-μm geometries with x-ray lithographyJournal of Vacuum Science and Technology, 1975
- Fabrication of silicon MOS devices using X-ray lithographyIEEE Transactions on Electron Devices, 1975