Measurement of atomic concentration profiles in thin films using nonresonant nuclear reactions

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Abstract
A general experimental technique and computational procedure is described for the quantitative determination of concentration profiles of atomic species in thin films. The theoretically expected charged-particle energy spectrum resulting from the bombardment of the sample by energetic charged particles is calculated and then compared with the experimentally observed spectrum to obtain the concentration profiles. This technique has been applied to the determination of diffusion coefficients, oxidation rates, and film thicknesses for a variety of samples.