Dry etching for submicron structures
- 1 April 1984
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 2 (2) , 464-469
- https://doi.org/10.1116/1.572367
Abstract
Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 μm linewidths.Keywords
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