Low-Temperature Silicon Epitaxy by Ion-Assisted Deposition

• 1 April 1999
• journal article
• Published by Trans Tech Publications, Ltd. in Solid State Phenomena
• Vol. 67-68, 459-464
• https://doi.org/10.4028/www.scientific.net/ssp.67-68.459

Abstract

Keywords

• IN SITU DOPING
• SILICON EPITAXY
• THIN FILM