Electronic properties of hole- and electron-dopedT’-,-, and infinite-layer-type high-cuprates
- 1 July 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 48 (2) , 1217-1232
- https://doi.org/10.1103/physrevb.48.1217
Abstract
We compare the electronic structure of n-type and p-type dopable high- cuprates, namely the hole-doped () system as well as the electron-doped (T’) and (‘‘infinite-layer’’) systems. Investigations were done mainly by means of core-level and valence-band photoemission spectroscopy. Also we performed auxiliary measurements of Hall effect and magnetic susceptibility. From the investigations on the Cu-O layers we propose that one criterion for electron dopability in high- cuprates is a comparatively high value of the Cu 3d Coulomb interaction . This is concluded from model calculations on core-level and valence-band spectra. Also the superconducting infinite-layer compound exhibits (besides a remarkably low Cu-O hybridization) this enhanced value of . For the rare-earth layers of T’ and we find small but characteristic differences in the electronic properties (Nd-O-hybridization and charge-transfer energy), which can be attributed to structural differences.
Keywords
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