Electronic properties of hole- and electron-dopedT’-,T*-, and infinite-layer-type high-Tccuprates

Abstract
We compare the electronic structure of n-type and p-type dopable high-Tc cuprates, namely the hole-doped Nd1.4 Ce0.2 Sr0.4 CuO4δ (T*) system as well as the electron-doped Nd2x Cex CuO4δ (T’) and Sr0.85 Nd0.15 CuO2δ (‘‘infinite-layer’’) systems. Investigations were done mainly by means of core-level and valence-band photoemission spectroscopy. Also we performed auxiliary measurements of Hall effect and magnetic susceptibility. From the investigations on the Cu-O layers we propose that one criterion for electron dopability in high-Tc cuprates is a comparatively high value of the Cu 3d Coulomb interaction Udd. This is concluded from model calculations on core-level and valence-band spectra. Also the superconducting infinite-layer compound Sr0.85 Nd0.15 CuO2δ exhibits (besides a remarkably low Cu-O hybridization) this enhanced value of Udd. For the rare-earth layers of T’ and T* we find small but characteristic differences in the electronic properties (Nd-O-hybridization and charge-transfer energy), which can be attributed to structural differences.