Loading Effect and Temperature Dependence of Etch Rate in CF₄Plasma

• 1 January 1979
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 18  (1) , 155-163
• https://doi.org/10.1143/jjap.18.155

Abstract

Keywords

• RATE RATIO
• ACTIVATION ENERGY
• PLASMA ETCHING