The effects of processing sequences on the microwave surface resistance of TlCaBaCuO

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Abstract
The effects of several microelectronic processing sequences on the high-frequency surface resistance of the high-temperature superconducting thin films in the TlCaBaCuO system have been examined. These processes include an acid etch, Br/alcohol etches, positive and negative photoresist sequences, and exposure to de-ionized water. The surface resistance decreases during the Br etch, remains constant during the negative photoresist process, and increases moderately during the positive photoresist sequence and on exposure to water. The surface resistance increases dramatically on exposure to the acid solution as might be expected from other work. The effects of extended exposures to de-ionized water and to Br etches on surface resistance are also presented.