High resolution patterning of aluminumoxide for intedrated optical devices
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 499-502
- https://doi.org/10.1016/0167-9317(89)90109-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low-loss bends in planar optical ridge waveguidesElectronics Letters, 1988
- Al2O3 films for integrated opticsThin Solid Films, 1986
- Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithographyApplied Physics Letters, 1986
- Plasma etching characteristics of chromium film and its novel etching modeJournal of Vacuum Science and Technology, 1980