SiC mask membrane for synchrotron radiation lithography
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 237-240
- https://doi.org/10.1016/0167-9317(90)90105-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Application Of Sic-X-Ray Masks For Fabricating Sub-Micron DevicesPublished by SPIE-Intl Soc Optical Eng ,1988
- Radiation stability and damage mechanisms in x-ray membranesJournal of Vacuum Science & Technology B, 1988
- Status And Prospects Of Sic-Masks For Synchrotron Based X-Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Silicon nitride single-layer x-ray maskJournal of Vacuum Science and Technology, 1982