Reduction of photoresist standing-wave effects by post-exposure bake
- 1 July 1975
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 22 (7) , 464-466
- https://doi.org/10.1109/T-ED.1975.18162
Abstract
A process is described for reducing the residual effects of standing waves upon exposed and developed lines in positive photoresist films.Keywords
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