t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies.
- 1 January 1993
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 6 (4) , 457-472
- https://doi.org/10.2494/photopolymer.6.457
Abstract
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