Mass-transfer analysis of a:Si:H deposition by the glow discharge process
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 695-698
- https://doi.org/10.1016/0022-3093(83)90266-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Mass transfer analyses of the plasma deposition processThin Solid Films, 1983
- Reaction mechanisms of the radio frequency glow discharged deposition process in silane-heliumThin Solid Films, 1979
- Plasma-promoted deposition of thin inorganic filmsJournal of Vacuum Science and Technology, 1979