High-current ion source for use on the PR-30 implanter

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Abstract
An ion source of the Freeman type has been extensively reworked and tailored for the routine production of dopant species on the PR‐30 ion implantation machine. The modified source is presently used on several such machines within the Bell System, routinely producing intense beams of B+, P+, As+, and Sb+. Typical PR‐30 target currents for the above species are 1, 5, 6, and 5 mA, respectively, with peak currents about 20% higher than these figures. With the possible exception of B+, these beam current intensities are the highest presently available for implantation applications. Further studies on improved B+ production are being pursued. BF3 gas is used as a feed for B+ production and solid charges are used for P+, As+, and Sb+, ususally without a carrier gas, so as to maintain maximum beam purity. The source lifetime is typically 30–60 h at the above current levels and is limited by filament sputtering. Operation of the source is relatively facile and good beam stability can be obtained.

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