H atom impact induced chemical erosion reaction at C:H film surfaces
- 23 December 1994
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 231 (2-3) , 193-198
- https://doi.org/10.1016/0009-2614(94)01233-4
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- HREEL spectroscopy of thin ion beam deposited C:H(D) filmsJournal of Electron Spectroscopy and Related Phenomena, 1993
- Modeling the elementary steps of low‐pressure diamond depositionAdvanced Materials, 1993
- A surface reaction with atoms: Hydrogenation of sp- and sp2-hybridized carbon by thermal H(D) atomsThe Journal of Chemical Physics, 1993
- Mechanism of chemical erosion of sputter-deposited C:H filmsApplied Physics Letters, 1992
- Evaluated Kinetic Data for Combustion ModellingJournal of Physical and Chemical Reference Data, 1992
- Methyl radical formation from filament pyrolysis of acetylene and acetylene/hydrogen mixtures within quartz tubesJournal of Vacuum Science & Technology A, 1990
- Measurement of stable species present during filament-assisted diamond growthApplied Physics Letters, 1988
- Low-Pressure, Metastable Growth of Diamond and "Diamondlike" PhasesScience, 1988
- Chemical erosion of amorphous hydrogenated carbon films by atomic and energetic hydrogenJournal of Nuclear Materials, 1987