Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. I. Preparation and characterization of TiO2 thin films
- 1 September 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 12 (5) , 2728-2732
- https://doi.org/10.1116/1.579096
Abstract
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