Interpretation of electrochemical behavior of nickel-implanted type-430 stainless steel using x-ray photoelectron spectroscopy and transmission electron microscopy
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1) , 19-25
- https://doi.org/10.1016/0040-6090(79)90093-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Electrochemical Behavior of Palladium‐Implanted TitaniumJournal of the Electrochemical Society, 1978
- Anodic Polarization Behavior of Fe‐Ni Alloys Fabricated by Ion ImplantationJournal of the Electrochemical Society, 1978
- The effect of ion implantation on the corrosion behaviour of pure iron-III. Tantalum ion implantationCorrosion Science, 1977
- The use of in the x-ray photo-electron spectroscopy analyses of passive layers on stainless steelCorrosion Science, 1977