Superconductivity of Mo/Si Multilayer Films

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Abstract
Multilayered Mo/Si thin films have been prepared by a dual rf-magnetron sputtering technique. X-ray diffractometry shows that the multilayer films with the modulation wavelength λ longer than 30 Å are composed of bcc Mo and amorphous Si, while with λ shorter than 30 Å are both amorphous. In the multilayers with d(Mo)=d(Si) (λ=d(Mo)+d(Si)), a maximum of Tc is 6.10 K for λ=23 Å. Tc decreases to 5 K with decrease of λ , which is close to Tc of amorphous Mo56Si44 alloy. Tc also decreases with increase of λ, which is explained by the proximity effect due to crystalline Mosublayers. The superconductivity of this multilayer films is concluded to result from amorphous MoSi phase. The anisotropy ratio, Hc2///HC2⊥, is 1.5–1.6 for λ shorter than 40 Å. This value of the anisotropy ratio is interpreted by the surface superconductivity. Thus, the superconductivity is 3-dimensional in this range of λ. The anisotropy increases to 29.0 for λ=234 Å. The large anisotropy is attributed to interlayer decoupling due to the amorphous Si and crystalline Mo.

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