Interface morphology in chemical vapour deposition on profiled substrates
- 31 May 1978
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 43 (4) , 488-496
- https://doi.org/10.1016/0022-0248(78)90348-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Morphological stability analysis in chemical vapour deposition processes. IJournal of Crystal Growth, 1978
- Morphological stability analysis in chemical vapour deposition processes. IIJournal of Crystal Growth, 1978
- Deposition and Properties of Silicon on Graphite SubstratesJournal of the Electrochemical Society, 1976
- Epitaxial Deposition of Silicon in Deep GroovesJournal of the Electrochemical Society, 1975
- A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal ReactorJournal of the Electrochemical Society, 1970
- Behavior of Large-Scale Surface Perturbations during Silicon Epitaxial GrowthJournal of the Electrochemical Society, 1967
- The Deborah NumberPhysics Today, 1964