Results of a Ta2O5 sputter yield round robin
- 1 December 1981
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 3 (6) , 240-242
- https://doi.org/10.1002/sia.740030603
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Atomic and Ionic Impact Phenomena on Metal SurfacesPublished by Springer Nature ,1965
- Simple Technique for Examination of Sputtering PatternsReview of Scientific Instruments, 1964
- Sputtering Experiments with 1- to 5-keV Ar+ IonsJournal of Applied Physics, 1963
- The determination of the thickness, dielectric constant, and other properties of anodic oxide films on tantalum from the interference coloursProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1958
- The kinetics of formation and structure of anodic oxide films on tantalumActa Metallurgica, 1953